(Note 3) Full CMOS memory cells:
A SRAM memory cell configuration
in which a total of six P-channel MOS transistor and N-channel MOS
transistor elements are formed on the same plane of the silicon
substrate. The surface area is large and there is a latch-up risk.
(Note 4) Stacked capacitor:
Capacitors with two electrodes formed
from polysilicon or metal. These capacitors are formed on the upper
layer of the MOS transistors on the silicon substrate.
(Note 5) Memory node:
Flip-flop circuit nodes within each memory
cell that store bits of information as “high” or “low” electric
potential.
(Note 6) Renesas has published on its website the results of its
evaluations of soft errors in systems employing Advanced LP SRAM. These
evaluations were run for more than a year under conditions similar to
the usage environment of average users, and in the end no errors were
detected. See the following URL for details:
http://www.renesas.com/products/memory/low_power_sram/child/renesas_effort.jsp
(Note 7) Thin-film transistor (TFT):
A transistor formed from
thin-film polysilicon. Such elements are used as the SRAM load
transistors, formed on the top layer of the MOS transistors on the
silicon substrate.
(Note 8) Latch-up:
A phenomenon in which an NPN or PNP structure
(parasitic bipolar transistor) formed by the well, silicon substrate,
P-type diffusion layer, and N-type diffusion layer of a CMOS transistor
enters the on state due to overvoltage from the power supply or input
pins, allowing a large current to flow between the power supply and
ground.
(Note 9) Reference values at a power supply voltage of 3.0 V and ambient temperature of 25°C.
(Note 10) The R1LV1616R Series and R1WV3216R Series, which employ the 150 nm process.
About Renesas Electronics Corporation
Renesas Electronics Corporation (TSE: 6723), the world’s number one supplier of microcontrollers, is a premier supplier of advanced semiconductor solutions including microcontrollers, SoC solutions and a broad-range of analog and power devices. Business operations began as Renesas Electronics in April 2010 through the integration of NEC Electronics Corporation (TSE:6723) and Renesas Technology Corp., with operations spanning research, development, design and manufacturing for a wide range of applications. Headquartered in Japan, Renesas Electronics has subsidiaries in 20 countries worldwide. More information can be found at www.renesas.com.
(Remarks) All registered trademarks or trademarks are the property of their respective owners.
Separate Sheet |
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Main Specifications of RMLV1616A Series and RMWV3216A Series |
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(16- and 32-Megabit Devices Using the 110 nm Process) |
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Power supply voltage: 2.7 V to 3.6 V |
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Minimum voltage when retaining data: 1.5 V |
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Product No. | Capacity | Word Organization | Package | Access Time | Standby Current | Sample Price | Sample Shipment | |||||||
RMLV1616AGBG-5S2 | 16 Mb | ×16 | FBGA (48) | 55 ns |
Up to 25°C:
0.5 μA (typ.)
3μA (max.)
Up to 40°C: 0.8 μA (typ.)
6 μA (max.)
Up to 70°C: 2.5 μA (typ.) 12 μA (max.)
Up to 85°C: 5 μA (typ.) 16 μA (max.) |
US$
16.50 |
Sep. 2015 | |||||||
RMLV1616AGSA-5S2 | TSOP I (48) | Jan. 2016 | ||||||||||||
RMLV1616AGSD-5S2 | μTSOP II (52) | Sep. 2015 | ||||||||||||
RMWV3216AGBG-5S2 | 32 Mb | FBGA (48) |
Up to 25°C:
1μA (typ.) 6μA (max.)
Up to 40°C: 1.6 μA (typ.) 12 μA (max.)
Up to 70°C: 5 μA (typ.) 24 μA (max.)
Up to 85°C: 10 μA (typ.) 32 μA (max.) |
US$31 | Sep. 2015 | |||||||||
(Remarks) All names of products or services mentioned in this press release are trademarks or registered trademarks of their respective owners. |