Six years ago, when OASIS was introduced, we published an article highlighting why it was a positive replacement for GDSII [1]. Since then, users have started adopting OASIS in their flows, with benefits and disadvantages. One of OASIS strengths is its flexibility (unlimited coordinate precision, unlimited number of layers, etc...). But this flexibility has a price in terms of memory consumption and computing time.
A new standard, OASIS.MASK, is being introduced to address the requirements specific to photomask layout repre- sentation. This subset of OASIS (and as such fully OASIS compliant)introduces constraints that reflect the real-world limitations of mask manufacturing. As a result, OASIS.MASK interpretation and exploitation is more efficient and reliable.
[1]P. Morey. Going from gdsii to oasis. EEtimes, December 2008.
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