MaskCompose enables Renesas Technology to capture reticle floorplans, wafer layouts, and fabrication data to allow fast, automated and error-free data generation within its 90 nanometer process. By using MaskCompose to improve its reticle design flow, Renesas Technology has enhanced flexibility while speeding interaction between device engineering and manufacturing. This is especially critical in today's competitive marketplace, where product life cycles can be as short as six months and the costs of integrated circuit (IC) design and masks continue to escalate.
"When looking to standardize our post layout design flows, we selected MaskCompose because of its flexibility for current and future nanometer processes," said Teruaki Harada, department manager of EDA Fundamental Technology Development Dept. at Renesas Technology Corp. "The proven ability of MaskCompose to enhance engineering efficiency and increase functionality allows us to streamline the process and reduce the risk in the critical mask-making steps that lead to first silicon."
"Renesas Technology's decision to standardize on MaskCompose for automated reticle design synthesis demonstrates their commitment to meeting the challenges of their 90 nanometer fab with innovative tools that optimize design, tapeout, and yield," said Dr. Marc Levitt, vice president, Design-for-Manufacturing at Cadence. "We're looking forward to continue working with Renesas Technology to increase yield through our broad range of industry-leading design tools."
About Cadence
Cadence is the world's largest supplier of electronic design technologies and engineering services. Cadence products and services are used to accelerate and manage the design of semiconductors, computer systems, networking equipment, telecommunications equipment, consumer electronics, and other electronics based products. With approximately 4,850 employees and 2003 revenues of approximately $1.1 billion, Cadence has sales offices, design centers, and research facilities around the world. The company is headquartered in San Jose, Calif., and trades on both the New York Stock Exchange and Nasdaq under the symbol CDN. More information is available at www.cadence.com.
Cadence and the Cadence logo are registered trademarks and MaskWeaver is a trademark of Cadence Design Systems, Inc. in the U.S. and other countries. All other trademarks are the property of their respective owners.
Contact:
Cadence Design Systems, Inc. Bruce Chan, 408-894-2961 Email Contact